| 摘要 |
<p>A device for feeding precursors of one or more elements to be deposited on a hot substrate into a chemical vapour deposition chamber (1). The device includes at least one container (10) for the liquid or dissolved precursor(s) (11), a system (12) for maintaining a higher pressure in the container than in the chamber, at least one injector combined with each container and provided with a control unit for periodically injecting precursor droplets of a given volume into the deposition chamber, and a system (3) for delivering the vaporised injected materials to a substrate located in the deposition chamber.</p> |
