发明名称 Photosensitive composition
摘要 The invention relates to a photosensitive composition containing a) a high-molecular-weight compound prepared by polymerisation of at least one polymerisable unit of the formula (I) below and b) a positive-working photosensitive substance <IMAGE> in which: A is a hydrogen atom, a halogen atom or an alkyl group; X is an oxygen atom, NH or N-R5, in which R5 is an alkyl group; and R1, R2, R3 and R4, which are identical or different, are each a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, -OR6, -OCO-R7, -NHCO-R8, -NHCONHR9, -OCONHR10, -CO-OR11, -CONHR12, -COR13, -CONR14R15, -CN or -CHO; or in which two of the radicals R1, R2, R3 and R4 can be combined with one another to form a ring, where R6, R7, R8, R9, R10, R11, R12, R 13, R14 and R15, which are identical or different, are in each case an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group, with the proviso that at least one of the radicals R1, R2, R3 and R4 is a substituent other than a hydrogen atom.
申请公布号 DE4426141(A1) 申请公布日期 1995.01.26
申请号 DE19944426141 申请日期 1994.07.22
申请人 FUJI PHOTO FILM CO., LTD., MINAMI-ASHIGARA, KANAGAWA, JP 发明人 KAWAMURA, KOICHI, SHIZUOKA, JP;TAKITA, SATOSHI, SHIZUOKA, JP;KAWAMURA, YOSHITAKA, SHIZUOKA, JP;AKIYAMA, KEIJI, SHIZUOKA, JP
分类号 G03F7/00;C08K5/105;C08K5/20;G03F7/023;G03F7/033;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/00
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