发明名称 |
Method of bonding semiconductor substrates |
摘要 |
In a method of bonding semiconductor substrates, a plurality of the semiconductor substrates are first prepared. Surfaces of the semiconductor substrates are mirror-polished. The mirror-polished surface of at least one of the semiconductor substrates is then provided with a hydrophilic property in such a way that an oxide layer is formed on the mirror-polished surface by exposing the mirror-polished surface to an atmosphere of at least one of an oxygen ion and an oxygen radical. A water molecule is then adhered to the mirror-polished surface. The semiconductor substrates then contact with each other through the mirror-polished surface. The contacted semiconductor substrates are then heated. According to such a method of bonding, the semiconductor substrates are strongly bonded to each other with hardly an unbonded region even if the semiconductor substrates are heated at a low temperature.
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申请公布号 |
US5383993(A) |
申请公布日期 |
1995.01.24 |
申请号 |
US19930118784 |
申请日期 |
1993.09.10 |
申请人 |
NIPPON SOKEN INC. |
发明人 |
KATADA, MITSUTAKA;TSURUTA, KAZUHIRO;FUJINO, SEIJI;ONODA, MICHITOSHI |
分类号 |
H01L21/20;(IPC1-7):H01L21/20;H01L21/02 |
主分类号 |
H01L21/20 |
代理机构 |
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主权项 |
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地址 |
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