| 摘要 |
<p>PURPOSE:To obtain an excellent transfer accuracy by a method wherein an exposing device has a reticle stage for scanning and moving a reticle and a wafer stage for scanning and moving a wafer and the inclination of a reference reflecting mirror provided on the wafer stage is detected to correct the scanning and moving direction of the reticle stage. CONSTITUTION:A reticle stage 2 is constituted of a driving means for scanning and moving a reticle 11, a measuring means for measuring the position and attitude of the reticle 11 and the like. On the other hand, a reference reflecting mirror 611, which is used at the time of a measurement of the position of a wafer stage using an interferometer, is provided on the wafer stage for scanning and moving a wafer 51 within a projection surface. The inclination of this mirror 611 is detected to detect the scanning and moving direction of the stage 2 and the scanning and moving direction is corrected on the basis of the detected result. Thereby, an excellent transfer accuracy can be obtained.</p> |
