发明名称 METHOD FOR PURIFICATION OF GAS, WASTE GAS, STEAM AND WATER FROM UNDESIRABLE CHEMICAL SUBSTANCE
摘要 PURPOSE: To provide an additive group for limiting much the electric charge rebinding reaction within a catalyst and reactivating the reaction during cleaning of gas, waste gas, steam and water by means of the catalyst. CONSTITUTION: In a cleaning method by means of the photocatalytic reaction carried out on the surface of a semiconductor oxide, particularly titanium dioxide, by energetic action of short wave-length light according to the floating bed or fixed bed principle or in a cleaning method of a catalyst from a mineralizing product formed by means of photocatalytic action, a semiconductor oxide is (a) added with at least one liq. or solid, inorg. acid, alkali, salt or hydrolysate, or (b) doped with at least one inorg. halogen compd. except for pure fluorine compd. as a halogen group forming agent, or (c) doped with at least one agent having combined properties and functions of (a) and (b).
申请公布号 JPH0716428(A) 申请公布日期 1995.01.20
申请号 JP19940030747 申请日期 1994.01.18
申请人 P C P FUOTOKATARITEIKU PURIFUIKATSUIOON GMBH 发明人 FURANTSU DEIITORIHI ESUTE
分类号 B01D53/32;B01D53/86;B01J35/02;C02F1/28;C02F1/72 主分类号 B01D53/32
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