| 摘要 |
<p>A scanning type exposure apparatus includes a mask stage (10) which can move a mask (12) in a predetermined scanning direction (y); a substrate stage (2) which can move a substrate (5), onto which a pattern on the mask is to be transferred, in the predetermined scanning direction; a fine movement stage (11) which is arranged on one of the mask stage and the substrate stage, and is movable in the scanning direction relative to the one stage; a first measuring device (14) for detecting the position, in the scanning direction, of the fine movement stage; a second measuring device (13) for detecting the position, in the scanning direction, of the other one of the mask stage and the substrate stage; a speed controller for controlling the ratio between the speeds of the mask stage and the substrate stage to a predetermined value while the pattern on the mask is scanning-exposed on the substrate; and a control device for controlling the position of the fine movement stage in correspondence with the difference between the position measured by the first measuring device and the position measured by the second measuring device during the scanning exposure. <IMAGE></p> |
