发明名称 Process and apparatus for production of a coating film.
摘要 <p>A technique of forming a synthesized diamond film including a mixed intermediate layer (9) of a plasma-spraying material and diamond uses plasma injection by a plasma-spraying torch for the plasma-sprayed material with simultaneous CVD by a CVD plasma torch for the diamond component to form the mixed layer on the substrate. This ensures accurate control of both components. Other embodiments involve the use of an RF or laser-induced plasma, with or without separate torches, so as to avoid the inclusion of electrode material in the layer formed, and yet further embodiments use a wire-feeder for the plasma-sprayed material so as to enable consistent and fine control of its supply as compared to the conventional powder supply. <IMAGE></p>
申请公布号 EP0481722(B1) 申请公布日期 1995.01.18
申请号 EP19910309476 申请日期 1991.10.15
申请人 FUJITSU LIMITED 发明人 KURIHARA, KAZUAKI;KAWARADA, MOTONOBU;SASAKI, KEN-ICHI;TESHIMA, AKITOMO
分类号 C01B31/06;B01J19/08;C23C4/12;C23C16/00;C23C16/27;C23C16/50;C23C26/00;C23C30/00;C30B29/04;(IPC1-7):C23C16/26;C23C16/30;C23C4/06;C23C4/10 主分类号 C01B31/06
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