| 发明名称 |
Exposure apparatus, and manufacturing method for devices using same. |
| 摘要 |
<p>An exposure apparatus includes an exposure device for exposing an exposure area of a substrate (3) through a pattern (21) of a mask (1), wherein the pattern involves writing error; and a correcting device for correcting the writing error of the pattern to correctly overlay the pattern on the exposure region. <IMAGE></p> |
| 申请公布号 |
EP0634701(A1) |
申请公布日期 |
1995.01.18 |
| 申请号 |
EP19940305113 |
申请日期 |
1994.07.13 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
JIGYOSHO, KOSUGI, C/O CANON K.K. |
| 分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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