| 摘要 |
<p>The disclosures relates to a susceptor for receiving and supporting a substrate during processing in a substrate processing chamber. The susceptor (236) includes a substrate receiving pocket (350) having a floor and generally upright sides. A circumscribing groove (354) is formed into the floor of the pocket and is dimensioned so that, when the substrate is received in the pocket, the groove lies at the perimeter of the substrate. The upright sides in conjunction with the groove operate to restrict substrate processing gas from reaching the underside of the substrate. The susceptor may further include a stepped formation (343), formed at its perimeter. The stepped formation interfaces with a complemental stepped formation (344) formed in a susceptor circumscribing preheat ring (340) located in the chamber and operates to restrict substrate processing gas from reaching the rear surface of the susceptor. <IMAGE></p> |
