发明名称 |
Charged particle beam exposure method and apparatus |
摘要 |
A charged particle beam exposure method for deflecting a charged particle beam in a deflection system which includes electromagnetic deflection coils, includes the steps of (a) controlling the deflection system based on deflection data, and (b) generating heat at least a vicinity of the electromagnetic deflection coils so as to compensate for a change in heat generated from the electromagnetic deflection coils.
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申请公布号 |
US5382800(A) |
申请公布日期 |
1995.01.17 |
申请号 |
US19930000039 |
申请日期 |
1993.01.04 |
申请人 |
FUJITSU LIMITED |
发明人 |
NISHINO, HISAYASU;YAMADA, AKIO;OAE, YOSHIHISA;YASUDA, HIROSHI |
分类号 |
G03F7/20;H01J37/147;H01L21/027;H01L21/30;(IPC1-7):H01J3/32 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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