| 摘要 |
The present invention relates to a cleaning treatment apparatus wherein two neighboring treatment chambers are allowed to communicate through a communicating opening provided in a lower portion of a separating wall that separates the two treatment chambers, and a movable treatment tank containing a treatment liquid is arranged in a movable manner within the two treatment chambers. The liquid contained in the movable treatment tank and the separating wall are in contact and the two treatment chambers are covered. This configuration ensures that the atmospheres in the two treatment chambers are mutually isolated so that the movable treatment tank can be used in both treatment chambers, the overall apparatus can be made more compact, and also the amount of treatment liquid used can be reduced. In addition, there is no need for a wafer conveyor means, so throughput can also be improved.
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