| 摘要 |
<p>PURPOSE:To provide a clean etching device, which enlarges the etching region of a wafer and at the same time, does not cause the generation of dusts. CONSTITUTION:A clamp 15 is provided so as to prevent from making contact to an orientation flat part 19 in a state of contact with a wafer W. A ceramic member 20 is made to adhere to part of a lower electrode 14 which is exposed to plasma. By constituting in such a way, the etching region of the wafer W is enlarged and at the same time, it becomes possible to prevent the device from causing the raising a dust.</p> |
