发明名称 DEVICE AND METHOD FOR TREATING SEMICONDUCTOR
摘要 PURPOSE:To reduce the stress damage to semiconductor parts by applying a pressurizing force to the semiconductor parts brought into contact with the joint surface of a substrate by supplying a high-pressure gas from the holding surface of a holding means. CONSTITUTION:After bringing semiconductor parts held by a suction collet 18 into contact with a substrate, the semiconductor parts are released from the attracting and holding state by stopping the evacuation from a vacuum pressure source while the collet 18 is maintained at the same position. At the same time, a load is applied to the semiconductor parts by blowing separately set high-pressure air upon the collet 18 through an air passage 19. Namely, the high-pressure air is uniformly blown upon the entire surface of the semiconductor parts from the attracting surface of the 18 and a pressurizing force is applied to the parts proportionally to the high-pressure air in a non-contacting state. As a result, the semiconductor parts are pressed against the joint surface of the substrate and both the parts and substrate are firmly stuck to each other.
申请公布号 JPH0715182(A) 申请公布日期 1995.01.17
申请号 JP19930153383 申请日期 1993.06.24
申请人 TOSHIBA CORP 发明人 NUMAJIRI KAZUO
分类号 B25J15/06;H01L21/52;H01L21/677;H01L21/68;H05K13/04 主分类号 B25J15/06
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