| 摘要 |
PURPOSE:To easily produce a rotating cathode target excellent in thermal shock resistance and capable of easily forming a transparent conducting film having high heat resistance thermal by subjecting a cylindrical target holder to plasma thermal spraying with a powder composed essentially of ZnO and containing specific amounts of Ga2O3 powder. CONSTITUTION:An undercoat is formed on the rough surface of a cylindrical target holder. Then, a powder composed essentially of ZnO and containing 1-10% Ga2O3 is plasma-thermal-sprayed onto the above to form a film. At this time, the above powder is transported in a semimolten state in a high temp. gas under a nonoxidizing atmosphere. Moreover, it is preferable to regulate the thermal expansion coefficient of the above undercoat to a value intermediate between those of the above holder and film or to a value close to that of a mixture of them and also to form the above undercoat by a plasma thermal spraying method. By this method, the target, hardly causing blackening during use, free from secular change, and capable of stably performing high speed film formation, can easily be obtained in a short time. |
