| 摘要 |
PURPOSE:To prevent the deterioration of the optical characteristic of an optical system due to the sticking, to the optical system, of the high polymer material that is scattered the irradiation of an excimer laser beam. CONSTITUTION:The device is provided with an excimer laser generator 1, a moving stage 11 for supporting and moving an object 10 to be worked which is composed of a high polymer material, and an optical system by which the excimer laser beam is guided and irradiates the object 10 through a mask 7 supported by a mask holder 8. The optical system is provided with a first total reflection mirror 4a, second total reflection mirror 4b, integrator lens 5, third total reflection mirror 4c, lighting system lens 6, and lens 9 for a reduction stepper, which are all successively arranged along the optical path of the excimer laser beam. The optical system, together with the third total reflection mirror 4c, is covered by a cover 2, and an ozonator 3 for supplying ozone is communicated with the adequate part of the cover 2. |
