| 摘要 |
<p>PURPOSE:To subject the exhaust gas from a semiconductor producing process to wet treatment using water while extremely reducing the load in waste water treatment, enhancing removal efficiency, enabling stable treatment and making the corrosion in a treatment apparatus hard to generate. CONSTITUTION:In a wet treatment method treating the exhaust gas 5 from a semiconductor producing process with a scrubber 1 using water as a washing soln. to remove a harmful gas component, at least a part 8 of water after washing is treated with an anion and/or cation exchange resin 2 to remove an ion and the treated water is again circulate (7, 9) as the washing soln. for re-use.</p> |
