发明名称 Mit einem harten Kohlenstoffilm beschichtetes Substrat sowie Verfahren und Vorrichtung zu dessen Herstellung
摘要 <p>A hard-carbon-film-coated substrate includes in stacked sequence a substrate, an intermediate layer, and a hard carbon film. The substrate consists of a metal or an alloy mainly composed of Ni or Al, or stainless steel. The intermediate layer is mainly composed of Ru, Si, Ge or carbon, or is a mixed layer including Ru, Si, or Ge mixed with at least one of carbon, nitrogen or oxygen, with a composition gradient across its thickness. An apparatus for forming the coated substrate especially includes means for forming the intermediate layer and means for forming the hard carbon film in the same vacuum chamber.</p>
申请公布号 DE4423184(A1) 申请公布日期 1995.01.12
申请号 DE19944423184 申请日期 1994.07.01
申请人 SANYO ELECTRIC CO., LTD., MORIGUCHI, OSAKA, JP 发明人 HIRANO, HITOSHI, MORIGUCHI, OSAKA, JP;KURAMOTO, KEIICHI, MORIGUCHI, OSAKA, JP;DOMOTO, YOICHI, MORIGUCHI, OSAKA, JP;KIYAMA, SEIICHI, MORIGUCHI, OSAKA, JP
分类号 C23C14/00;C23C16/02;C23C16/26;C23C16/458;C23C16/511;H01J37/32;(IPC1-7):C23C16/26;H05H1/42;C23C16/50;C23C16/30;H05H1/30 主分类号 C23C14/00
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