发明名称 |
Plasma-supported, chemical vacuum-coating installation |
摘要 |
A plasma chamber (4) is arranged, coaxially to a vacuum pump connection (2, 3), in a vacuum container (1). This plasma chamber has a screen (5) which forms an envelope surface and into which an end wall (6, 7) can be moved from the direction of the two end faces, which end wall has a central process-gas inlet (8, 9). Between the end walls (6, 7), there is arranged a substrate holder (12) which simultaneously forms an electrode (10). <IMAGE>
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申请公布号 |
DE4321639(A1) |
申请公布日期 |
1995.01.12 |
申请号 |
DE19934321639 |
申请日期 |
1993.06.30 |
申请人 |
LEYBOLD AG, 63450 HANAU, DE |
发明人 |
CORD, BERNHARD, DR., 63755 ALZENAU-ALBSTADT, DE;BEICHLER, BARBARA, DR., 63110 RODGAU, DE |
分类号 |
C23C16/44;C23C16/455;C23C16/509;H01J37/32;(IPC1-7):H01J37/32;H05H1/10;C23C16/50 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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