发明名称 Plasma-supported, chemical vacuum-coating installation
摘要 A plasma chamber (4) is arranged, coaxially to a vacuum pump connection (2, 3), in a vacuum container (1). This plasma chamber has a screen (5) which forms an envelope surface and into which an end wall (6, 7) can be moved from the direction of the two end faces, which end wall has a central process-gas inlet (8, 9). Between the end walls (6, 7), there is arranged a substrate holder (12) which simultaneously forms an electrode (10). <IMAGE>
申请公布号 DE4321639(A1) 申请公布日期 1995.01.12
申请号 DE19934321639 申请日期 1993.06.30
申请人 LEYBOLD AG, 63450 HANAU, DE 发明人 CORD, BERNHARD, DR., 63755 ALZENAU-ALBSTADT, DE;BEICHLER, BARBARA, DR., 63110 RODGAU, DE
分类号 C23C16/44;C23C16/455;C23C16/509;H01J37/32;(IPC1-7):H01J37/32;H05H1/10;C23C16/50 主分类号 C23C16/44
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