发明名称 TRANSISTORS AND METHODS FOR FABRICATION THEREOF
摘要 In a bipolar transistor (110), the collector and the base (114) are formed in an isolation region laterally bounded by a field insulator. The isolation region corners are spaced far from the emitter (122) to reduce the collector-emitter leakage current. The base (114) does not extend laterally throughout the isolation region. Thus the base (114) is small and the collector-base capacitance is small as a result. Those corners of the isolation region that are not covered by a base contact region are covered and contacted by an insulator. This insulator prevents the field insulator from being pulled back during wafer clean steps. Consequently, the field insulator does not expose the collector. Further, the insulator covering the corners prevents the metal silicide on the surface of the extrinsic base from contacting the corners. The insulator overlying the corners thus reduces the collector-base leakage current.
申请公布号 WO9501653(A1) 申请公布日期 1995.01.12
申请号 WO1994US06907 申请日期 1994.06.17
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 GRUBISICH, MICHAEL, J.;IRANMANESH, ALI, A.
分类号 H01L21/331;H01L21/8249;H01L27/06;H01L29/08;H01L29/732;(IPC1-7):H01L29/732 主分类号 H01L21/331
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