发明名称 PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To enable a processing device to be lessened in size and scaled up in development contents, by a method wherein the space scale of electron's motion in a plasma generating region is enlarged A times, and a time scale is reduced to 1/B when a plasma processing device is similarly enlarged A times in scale, and the motion state of electron is controlled based on the product of a space scale multiplied by a time scale. SOLUTION: It is required that a gas pressure in a plasma generating region is set so as to be reduced to 1/A. This low pressure of gas is attained by controlling a space pressure with a vacuum pump connected to an exhaust means 18. When a law of similarity is applied, it is preferable that electrons in a plasma generating region are enhanced in incident energy. Therefore, an electron acceleration potential difference between a blocking/transmitting mechanism 13 and a plate electrode 10 is enlarged A times. In this case, the state of a motion r(t) of an electron is controlled so as to be a motion A.r(t/B) taking advantage of a position vector r( t) as a function of a time t. By this setup, a plasma processing device enlarged A times in scale is capable of having the same plasma state as a plasma processing device of original scale.
申请公布号 JP2000183039(A) 申请公布日期 2000.06.30
申请号 JP19980356027 申请日期 1998.12.15
申请人 TOKYO ELECTRON LTD 发明人 KOIZUMI KOJI
分类号 H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):H01L21/306 主分类号 H01L21/302
代理机构 代理人
主权项
地址