LASER RADIATING DEVICE AND METHOD/BEAM HOMOGENIZER/ SEMICONDUCTOR DEVICE AND ITS MANUFACTURE

摘要

PROBLEM TO BE SOLVED: To anneal a semiconductor film by laser irradiation with an enough uniformity and a high productivity over a large range of thickness. SOLUTION: A laser irradiating device emits line-shaped laser beams with scanning in the direction of the beam width. The laser beam has a first energy E1 density at a first beam width W1 on the irradiating surface and has a second energy E2 density at a second beam width W2. The second energy density is higher than the first energy density.