<p>An object of this invention is to provide a pattern forming material having a high exposure tolerance and rarely causing the dimensions of a pattern to vary with respect to the variation of exposure. The present invention relates to a pattern forming material characterized in that the pattern forming material contains (A) a compound generating acid by the irradiation of active rays of light, (B) a compound generating base or increasing its basicity on irradiation with active rays of light, (C) a compound having at least one bond capable of being cleft with acid, and/or (D) a compound not dissolving in water but dissolving in an alkali aqueous solution.</p>
