Radiation sensitive resist composition.

摘要

A radiation-sensitive resist composition comprising a surface active agent having a perfluoroalkenyl group having 6 or more carbon atoms in the molecule. When said radiation-sensitive resist composition is filtered through a filter, the surface active agent is not adsorbed by the filter, so that striation is not caused and a coating film having a uniform thickness is always stably obtained from the above composition. Said radiation-sensitive resist composition is also excellent in developability.