Photosensitive material and image forming method.

摘要

In an image forming method, a photosensitive material comprises a photosensitive layer and a polymerisable layer which are laminated. An area of the polymerisable layer, corresponding to an unexposed area of the photosensitive layer, is polymerised when the photosensitive material is exposed to light, preferably with a wavelength of 400 to 900 nm, and heated to 60 to 80 DEG C. <IMAGE>