| 摘要 |
PURPOSE: To measure overlay misregistration during semiconductor processing by forming an inspection system, including an interference microscope that is used in combination with a camera, a wafer transport stage and a data processing electronics. CONSTITUTION: An inspection system comprises a coherence probe microscope such as an KINNIK microscope 70 that is used in combination with a camera 72, a wafer transfer stage 74, a data processing electronic device 76, and a CRT display or a host computer 78. The system utilizes both the light rays of a wide or narrow band and a large or small numerical apertures(NA), in order to develop a series of interference images taken at different Z levels with respect to an inspection surface or at different P (pulse duration) scanning positions, with respect to a difference of arms of interferometers. As a result, overlay misregistration can be measured during semiconductor processing. |
