| 摘要 |
PURPOSE: To generate acid having high thermal stability, high resolution and high sensitivity and having no corrosive action as a photoreaction product by incorporating a compound forming acid when exposed to radiation, a compound having bonds such as C-O-C that can be cleft by acid, and a polymer binder that can be insoluble to water but soluble to aqu. solution of alkali. CONSTITUTION: The mixture contains a) a compound forming acid when exposed to chemical ray radiation, b) a compound containing a C-O-C or C-O-Si bond that can be cleft by acid, and c) a polymer binder that is insoluble to water but soluble to or swelled in aqu. solution of alkali. The compound a) is indicated by the formula. In the formula, S represents 1 to 20C acyclic, homocyclic and heterocyclic groups, EWG represents an electron withdrawing group, R<1> represents 1 to 20C acyclic, homocyclic and heterocyclic groups, W is 0, 1 or 2, and X is an integer of 1∼5. |
