发明名称 Method of growing single crystal of compound semiconductors
摘要 A method of growing a single semiconductor crystal with a flat top. In order to grow a single flat top crystal, the InP crystal is pulled up after the temperature drop of the melt has almost stopped, at a point in time when a meniscus at the interface of solid-liquid can be seen over the whole circumference of the surface of the melt. This prevents a facet from appearing at the shoulder portion of the crystal, thus reducing the generation of twin crystals and drastically improves retension of single crystal formation.
申请公布号 US5379717(A) 申请公布日期 1995.01.10
申请号 US19930063344 申请日期 1993.05.18
申请人 THE FURUKAWA ELECTRIC CO., LTD. 发明人 YOSHIDA, SEIKOH;OZAWA, SHOICHI;KIKUTA, TOSHIO
分类号 C30B15/00;C30B15/22;(IPC1-7):C30B15/28 主分类号 C30B15/00
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