| 摘要 |
PURPOSE:To decrease the amt. of metal impurities in a photosensitive resin compsn. without decreasing the sensitivity. CONSTITUTION:This photosensitive resin compsn. is prepared by dissolving a quinonediazide photosensitive compd. and an alkali-soluble resin in an org. solvent. In this production method, the quinonediazide photosensitive compd. and the alkali-soluble resin are dissolved in an org. solvent essentially comprising at least one of aliphatic ether esters, aliphatic ketone esters, aliphatic hydroxycarboxylates, aliphatic hydroxyketones, aliphatic ether ketones, and aliphatic ether alcohols. The obtd. soln is brought into contact with a gel-type strong acid anion exchange resin. |
