发明名称 |
Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
摘要 |
The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B4C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers
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申请公布号 |
US6396900(B1) |
申请公布日期 |
2002.05.28 |
申请号 |
US20010847744 |
申请日期 |
2001.05.01 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
BARBEE, JR. TROY W.;BAJT SASA |
分类号 |
G03F7/20;G21K1/06;H01L21/027;(IPC1-7):G21K1/06 |
主分类号 |
G03F7/20 |
代理机构 |
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地址 |
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