Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network.
摘要
申请公布号
EP0254853(B1)
申请公布日期
1995.01.04
申请号
EP19870108644
申请日期
1987.06.16
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
BRUNSVOLD, WILLIAM ROSS;CROCKATT, DALE MURRAY;CHOW, MING-FEA;FRECHET, JEAN-MARIE JOSEPH;CONLEY, WILLARD EARL;HEFFERSON, GEORGE JOSEPH;ITO, HIROSHI;IWAMOTO, NANCY ELLEN;WILLSON, CARLTON GRANT
