发明名称 Electrode connections for semiconductor devices
摘要 A semiconductor device includes a semiconductor substrate (1) having a surface, an electrode (4a) comprising a first metal disposed on the surface of the semiconductor substrate (1), a wiring layer (9a) comprising a second metal which is different from the first metal, and a barrier metal layer (8a) interposed between the electrode (4a) and the wiring layer (3a). The barrier metal layer (8a) comprises a third metal which prevents solid phase diffusion between the first metal and the second metal even if heat is applied. Therefore, the electrode (4a) and the wiring layer (9a) are connected with reduced contact resistant and high reliability. <IMAGE>
申请公布号 GB2279498(A) 申请公布日期 1995.01.04
申请号 GB19930023286 申请日期 1993.11.11
申请人 * MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TOSHIHIKO * SHIGA;RYO * HATTORI;TOMOKI * OKU
分类号 H01L21/28;H01L21/768;H01L23/485;H01L23/522;H01L23/532;H01L29/43;H01L29/45;(IPC1-7):H01L23/48 主分类号 H01L21/28
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