发明名称 |
Method for removing impurities from resist components and novolak resins |
摘要 |
A method of removing ionic impurities from a resist component, comprising the steps of: (a) dissolving said resist component in a solvent; (b) contacting said resist component solution with a fibrous ion exchange resin for a sufficient amount of time to remove at least a portion of said ionic impurities onto said fibrous ion exchange resin; and (c) separating said fibrous ion exchange resin bearing said ionic impurities from said resist component solution.
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申请公布号 |
US5378802(A) |
申请公布日期 |
1995.01.03 |
申请号 |
US19910753526 |
申请日期 |
1991.09.03 |
申请人 |
OCG MICROELECTRONIC MATERIALS, INC. |
发明人 |
HONDA, KENJI |
分类号 |
G03F7/004;C08G8/12;G03F7/023;G03F7/26;H01L21/027;(IPC1-7):C08F6/08 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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