发明名称 Method for removing impurities from resist components and novolak resins
摘要 A method of removing ionic impurities from a resist component, comprising the steps of: (a) dissolving said resist component in a solvent; (b) contacting said resist component solution with a fibrous ion exchange resin for a sufficient amount of time to remove at least a portion of said ionic impurities onto said fibrous ion exchange resin; and (c) separating said fibrous ion exchange resin bearing said ionic impurities from said resist component solution.
申请公布号 US5378802(A) 申请公布日期 1995.01.03
申请号 US19910753526 申请日期 1991.09.03
申请人 OCG MICROELECTRONIC MATERIALS, INC. 发明人 HONDA, KENJI
分类号 G03F7/004;C08G8/12;G03F7/023;G03F7/26;H01L21/027;(IPC1-7):C08F6/08 主分类号 G03F7/004
代理机构 代理人
主权项
地址