| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide photoresists that comprise a blend of at least two distinct phenolic polymers, wherein each polymer has distinct photoacid labile groups from the other polymer, the photoresists exhibiting excellent resolution of a formed image in lithographic processing. <P>SOLUTION: In a photoresist composition, one or preferably both distinct phenolic resins of a blend have extremely low polydispersity values. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
