发明名称 Method for fabricating a semiconductor component using contact printing
摘要 A method for fabricating semiconductor components includes the steps of providing semiconductor dice on a substrate and forming a polymer layer on the substrate. In addition, the method includes the steps of providing a stencil having patterns thereon, and pressing the stencil into the polymer layer to form complimentary patterns in the polymer layer. The method also includes the steps of forming conductors in the polymer layer by forming a conductive layer on the complimentary patterns, and planarizing the conductive layer and the polymer layer to a same surface. A system for performing the method includes the substrate, the stencil and an energy source for curing the polymer layer. The system also includes an optical or mechanical alignment apparatus for aligning the stencil to the substrate.
申请公布号 US6969681(B2) 申请公布日期 2005.11.29
申请号 US20040002031 申请日期 2004.12.01
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.
分类号 H01L21/302;H01L21/44;H01L21/4763;H01L21/50;H01L21/768;H01L23/31;H01L23/532;(IPC1-7):H01L21/302 主分类号 H01L21/302
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