发明名称 Optical analysis system and positioning apparatus thereof
摘要 PCT No. PCT/GB92/02239 Sec. 371 Date Jul. 19, 1993 Sec. 102(e) Date Jul. 19, 1993 PCT Filed Dec. 2, 1992 PCT Pub. No. WO93/11469 PCT Pub. Date Jun. 10, 1993.An optical analysis or processing system for use, for example, in the analysis of microscopic spots of material by their effect on a very fine polarized beam of light (e.g., FPIA). For multiple "spot" analysis the spot samples are disposed on a substrate in predetermined relation with an optical pattern, bars, chevrons, etc. The substrate is mounted in the path of the fixed and focused beam with three degrees of freedom of movement. A video camera records the optical pattern very accurately and controls the substrate mounting to position a selected sample spot at the beam focus. Multiple and rapid sample analysis can thus be performed.
申请公布号 US5376804(A) 申请公布日期 1994.12.27
申请号 US19930090071 申请日期 1993.07.19
申请人 GEC-MARCONI LIMITED 发明人 COLEMAN, CLIVE I.
分类号 G01B11/00;G01B11/26;G01N21/59;G01N21/64;G01N21/86;G02B21/26;(IPC1-7):G01N21/86 主分类号 G01B11/00
代理机构 代理人
主权项
地址