发明名称 Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder
摘要 A radiation-sensitive mixture, a radiation-sensitive recording material produced from the mixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains (1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and (2) a 1,2-quinone diazide and/or a combination of a compound which forms strong acid when exposed to actinic radiation and a compound containing at least one acid-cleavable C-O-C bond. The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of -CH3-nXn units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.
申请公布号 US5376496(A) 申请公布日期 1994.12.27
申请号 US19910648143 申请日期 1991.01.30
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 ELSAESSER, ANDREAS;FRASS, HANS W.;MOHR, DIETER
分类号 G03F7/004;G03F7/023;G03F7/039;H01L21/027;(IPC1-7):G03F7/023 主分类号 G03F7/004
代理机构 代理人
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