Structure for a semiconductor device comprising conductive trench sidewalls

摘要

A structure for a semiconductor integrated circuit device comprises a p-type transistor and an n-type transistor, with each transistor having two diffusion regions. A trench interposed between the two transistors comprises a pair of conductively doped sidewalls. One sidewall is electrically coupled with power, and the other is electrically coupled with ground. A diffusion region from each transistor is electrically coupled with one of the sidewalls, with one transistor receiving power and the other receiving ground from the conductive sidewalls. The two transistor diffusion regions not electrically coupled with one of the sidewalls are electrically interconnected.