SUBSTRATE BRUSH SCRUBBING AND PROXIMITY CLEANING-DRYING SEQUENCE USING COMPATIBLE CHEMISTRIES, AND PROXIMITY SUBSTRATE PREPARATION SEQUENCE, AND METHODS, APPARATUS, AND SYSTEMS FOR IMPLEMENTING THE SAME

摘要

A method of cleaning and drying a front and back surface of a substrate is provided. The method includes brush scrubbing the back surface of the substrate using a brush-proximity cleaning and/or drying system (100). The system includes a chamber (104), front and back proximity heads (110a) and (110b) secured to an actuating component (114) and a system controller (116). The chamber has a plurality of rollers (108) configured to engage and rotate a wafer (102). The method includes applying a front meniscus onto the front surface of the substrate upon completing the brush scrubbing of the back surface.