| 发明名称 |
Control apparatus and method for a substrate tray on an in-line sputtering apparatus |
| 摘要 |
The number of times a substrate tray has been used and the amount of distortion of the substrate tray are measured. When the number of times of use or the distortion amount of the substrate tray exceed a predetermined value, respectively, the substrate tray is exchanged automatically.
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| 申请公布号 |
US5376777(A) |
申请公布日期 |
1994.12.27 |
| 申请号 |
US19910795732 |
申请日期 |
1991.11.21 |
| 申请人 |
HITACHI, LTD. |
发明人 |
KAMEI, MITSUHIRO;SETOYAMA, EIJI |
| 分类号 |
C23C14/34;C23C14/50;C23C14/56;C23C16/54;G07C3/04;(IPC1-7):G06F15/20;G07B15/02 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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