发明名称 EMBOSSED-PATTERN TRANSFER SHEET AND METHOD OF PATTERN TRANSFER
摘要 A transfer sheet (10) for an embossed pattern comprises a base film (11) on which a mold release layer (12), a coloring layer (13), a reflection layer (14) and a photosensitive resin layer (15) are laminated. When symbols are formed on a dial of a timepiece, the photosensitive resin layer (15) is first exposed through a negative film (16), which includes opaque regions (161) corresponding to the symbols. Accordingly, when the photosensitive resin layer (15) is immersed in water and developed, the mold release layer (12), the coloring layer (13), the reflection layer (14) and a patterned resin layer (150) are left on the base film (11). Then, a pressure-sensitive adhesive layer (17) is formed on only the surface of the patterned resin layer (150), and the transfer sheet (10) and the dial are bonded. Thereafter, when the transfer sheet (10) is peeled from the dial, the reflection layer (14) and the coloring layer (13) corresponding to the formation portion of the patterned resin layer (150) are transferred to the dial.
申请公布号 WO9429128(A1) 申请公布日期 1994.12.22
申请号 WO1994JP00831 申请日期 1994.05.25
申请人 SEIKO EPSON CORPORATION;KOBAYASHI, KOICHI;IWANAMI, WATARU;KANAI, TAIYO;HORIUCHI, HIDEKI 发明人 KOBAYASHI, KOICHI;IWANAMI, WATARU;KANAI, TAIYO;HORIUCHI, HIDEKI
分类号 B32B38/10;B32B38/14;B44C1/17;B44C1/22;G03F7/40;G04B19/10;G04B19/12;G04D3/00;(IPC1-7):B44C1/17 主分类号 B32B38/10
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