| 摘要 |
PURPOSE:To provide a projection aligner which is constituted without using any beam splitter, but a reflecting and refracting systems, uses a cata-dioptric projecting optical system which is less in luminous flux and has a large numerical aperture, and adopts a slit scanning exposure system having an excellent image forming ability. CONSTITUTION:The light from a pattern 24 in an illuminated area 23 reaches a plane mirror M1. with a long and narrow opening S1 at its center through a first convergence group G1 and, after the light is reflected by the mirror M1, the luminous flux reflected by a second convergence group G2, forms the intermediate image 24A of the pattern 24 in the opening S1. of the mirror M1. The luminous flux from the image 24A further forms the image 24B of the image 24B on a wafer 25 through a third convergence group G3. |
