RADIATION SENSITIVE RESIST HAVING TWO-LAYERED STRUCTURE, ITS PRODUCTION AND RESIST PATTERN FORMING METHOD USING THE SAME

摘要

PURPOSE:To inhibit deformation from a desired resist pattern by a variation of the film thickness of a radiation sensitive resist due to the reflection of radiation from the substrate and to extend the tolerance level of process conditions in a producing process as well as to give a high yield. CONSTITUTION:This radiation sensitive resist having a two-layered structure has a thin film based on a conjugated polymer having electron withdrawing functional groups other than cyano between the substrate and a radiation sensitive resist.