| 摘要 |
PURPOSE:To make is possible to enhance resistance to irradiation with a laser, to prolong the life of a mask for laser baking and to obtain irradiation patterns in a way as light shielding patterns are separated even with island-shaped patterns separated with these patterns by cooling the mask by a cooling medium at the time of the irradiation with the laser. CONSTITUTION:The mask is cooled by the cooling medium at the time of the irradiation with the laser in the laser baking method for baking the patterns 2 to a base material 10 by subjecting this material to the irradiation with the laser via the mask provided with the patterns. The photomask is mounted on a supporting plate 3 in a part of the substrate 1 as the method for using a mask holder. A rear surface plate 4 is disposed on the side opposite to the photomask for backing in proximity to this supporting plate 3. The part where the laser passes is provided with a transparent light transmission window plate 5 same with a plate 1 of the photomask. The cooling media 6, 7 are passed between the supporting plate 3 and the rear surface plate 4 to cool the substrate 1 and light shielding patterns 2 of the photomask at the time of the irradiation with the laser, by which the deterioration of the photomask by backing light 8 is prevented. |
