| 摘要 |
A method for aligning layers used in the production of microelectronics components, comprises superpositioning a first layer (4), having a small selectively positioned x-ray-transparent area (3), over a second layer having an alignment dot (5) selectively positioned on one of its surfaces, the alignment dot being composed of four different metal elements (ABCD) separately located in four equally spaced adjacent areas of the dot, passing an x-ray beam generated in an end-window x-ray tube through the transparent area, irradiating at least a portion of the dot and generating fluorescent x-rays from at least one of the metals, selectively detecting the fluorescent x-rays generated and adjusting the superposed relation of the first and second layers so that the detected x-rays from all four different metals reach a predetermined level.
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