发明名称 EXPOSURE METHOD AND DEVICE
摘要 PURPOSE:To distribute a lamp light source and a lighting state uniformly and improve the landing accuracy of electron beams by slightly rotating projection light with a face panel inner surface and a panel inner surface and then compensating the distribution of illuminance on a sensitized covering according to the projection light. CONSTITUTION:A lamp light source is slightly rotated within a surface which is in parallel with the inner surface of a face panel 1 and the distribution of illuminance on a resist film according to the reflection light from the lamp light source is compensated. Namely, when the distribution of illuminance within the surface of the rectangular face panel 1 is strong, for example, at one diagonal corner part 1b and is weak at the other diagonal corner part 1b, the lamp light source is slightly rotated within a surface which is in parallel to the inner surface of the face panel 1, thus achieving compensation so that the deviation state is large at one opposing center part 1a and weak at the other opposing side center part 1a and hence obtaining a uniform distribution of illuminance within the face panel surface and accurately adjusting the position of the lamp light source.
申请公布号 JPH06349709(A) 申请公布日期 1994.12.22
申请号 JP19930140273 申请日期 1993.06.11
申请人 NEC KANSAI LTD 发明人 TSUCHIYA NOBUYUKI
分类号 G03B27/32;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03B27/32
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