发明名称 WAFER RETAINING PLATEN AND LIFTING MEANS
摘要 <p>An apparatus for releasably holding a workpiece in semiconductor processing systems such as a batch ion implanter which comprises a linkage mechanism mounted onto the backside of a platen for clamping a wafer (2) against a fence (1A) of a supporting means (1) and a pusher means (11) mounted on a wafer lift means (13) for engagement with a lever mechanism (5, 6, 7, 9, 10, 15) for locking and unlocking the device, and sensing any misclamp of the workpiece.</p>
申请公布号 WO1994029036(A1) 申请公布日期 1994.12.22
申请号 US1994006708 申请日期 1994.06.13
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