发明名称 |
METHOD FOR CORRECTING DEFECT OF STRUCTURAL BODY |
摘要 |
<p>PURPOSE:To provide the method for correcting a structural body by flatly correcting either of a projecting defect or recessed defect flush with a substrate surface. CONSTITUTION:This method for correcting the defect of the structural body which corrects the projecting defect 102 generated in the structural body formed with desired patterns on a substrate 101 includes a stage for forming a first thin film 104 consisting of a material different from the substrate 101 on the substrate 101 around the projecting defect 102 or so as to be approximate to the projecting defect 102, a stage for forming a second thin film 105 on the projecting defect 102 and the first thin film 104 and flattening the front surface thereof, a stage for simultaneously removing the projecting defect 102 and the respective thin films in the upper part thereof and the peripheries thereof by using charged particle ray and a stage for removing the respective thin films remaining in this removing stage.</p> |
申请公布号 |
JPH06347997(A) |
申请公布日期 |
1994.12.22 |
申请号 |
JP19930274491 |
申请日期 |
1993.11.02 |
申请人 |
TOSHIBA CORP |
发明人 |
NAKAMURA HIROKO;KOMANO HARUKI;KARIYA MITSUYO;INOUE SOICHI;SUGIHARA KAZUYOSHI;MORI ICHIRO;HORIOKA KEIJI;MIYOSHI MOTOSUKE;WATANABE TORU;OKANO HARUO;OKUMURA KATSUYA;TAKIGAWA TADAHIRO;YAMAZAKI YUICHIRO |
分类号 |
B23K15/00;G03F1/29;G03F1/30;G03F1/72;G03F1/74;H01J37/305;H01L21/027;H01L21/30;(IPC1-7):G03F1/08 |
主分类号 |
B23K15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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