发明名称 POT FOR BARREL POLISHING AND BARREL POLISHING METHOD
摘要 PURPOSE:To provide a barrel polishing pot and a barrel polishing method, by which a precision small part can be worked efficiently and with high quality. CONSTITUTION:Abrasion grains 3 are made to adhere and fixed to the inner surface of a barrel polishing pot 1 by a dispersion plating method. Fluid fine powder 20 is made coexist with a workpiece 10 in a light-alloy barrel polishing pot and the barrel polishing pot 1 where abrasive grains 3 are made adhere and fixed to the inner surface to perform barrel polishing.
申请公布号 JPH06344257(A) 申请公布日期 1994.12.20
申请号 JP19930134733 申请日期 1993.06.04
申请人 SEIKO EPSON CORP 发明人 AYUSAWA YUTAKA
分类号 B24B31/02;(IPC1-7):B24B31/02 主分类号 B24B31/02
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