| 摘要 |
[PROBLEMS] To provide a coating-type underlayer film forming composition containing a naphthalene resin derivative for lithography. [MEANS FOR SOLVING PROBLEMS] A coating-type underlayer film forming composition containing a naphthalene resin derivative for lithography, comprising a compound represented by the following general formula (1): [Chemical formula 1] Formula (1) wherein A represents an aromatic group-containing organic group; R1 represents a hydroxyl, alkyl, alkoxy, halogen, thiol, amino, or amide group; m1 represents the number of A as a substituent of the naphthalene ring and is an integer of 1 to 6; m2 represents the number of R1 as a substituent of the naphthalene ring and is an integer of 0 to 5; the sum of m1 and m2 is an integer of 1 to 6, provided that, in the case of an integer other than 6, the remaining part represents a hydrogen atom; and n is 2 to 7000 repeating units.
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