发明名称 |
Robotically loaded epitaxial deposition apparatus |
摘要 |
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
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申请公布号 |
US5374159(A) |
申请公布日期 |
1994.12.20 |
申请号 |
US19930044919 |
申请日期 |
1993.04.08 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SEVERNS, DAVID W.;TOMPSON, BRIAN;LINDSTROM, PAUL R.;CARLSON, DAVID K. |
分类号 |
H01L21/205;C23C16/54;C30B25/02;C30B35/00;H01L21/673;H01L21/687;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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